Publication
Polymer Engineering & Science
Paper

Electron beam processing systems (a state of the art review)

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Abstract

This paper presents a review of electron‐sensitive resists evaluated for electron beam exposure. This includes positive as well as negative resists and their relative merits and drawbacks. The paper also presents general guidelines that can be used in evaluating any electron resist system for performance and usefulness in electron beam microfabrication. Copyright © 1974 Society of Plastics Engineers, Inc.

Date

25 Aug 2004

Publication

Polymer Engineering & Science

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