A.N. Broers, E.G. Lean, et al.
Applied Physics Letters
Electron penetration and scattering in solids can be measured by electron beam exposure of a positive electron resist. The beam profile is obtained by exposing a long line of controlled width in a thick layer of poly-(methyl methacrylate) resist. The cross section of the developed line which can be examined in the scanning electron microscope represents the beam density profile. © 1971 The American Institute of Physics.
A.N. Broers, E.G. Lean, et al.
Applied Physics Letters
M. Hatzakis
JES
J. Paraszczak, E. Babich, et al.
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
D. Kern, J. Paraszczak, et al.
Microcircuit Engineering 1982