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IEEE Transactions on Magnetics
Electron penetration and scattering in solids can be measured by electron beam exposure of a positive electron resist. The beam profile is obtained by exposing a long line of controlled width in a thick layer of poly-(methyl methacrylate) resist. The cross section of the developed line which can be examined in the scanning electron microscope represents the beam density profile. © 1971 The American Institute of Physics.
R.B. Laibowitz, C.C. Tsuei, et al.
IEEE Transactions on Magnetics
J. Paraszczak, E. Babich, et al.
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
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ISSCC 1973
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Microelectronic Engineering