Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
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76 results for R. Sooriyakumaran
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Polysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
The synthesis of soluble, substituted silane high polymers by Wurtz coupling techniques
- R.D. Miller
- D. Thompson
- et al.
- 2003
- Journal of Polymer Science Part A: Polymer Chemistry
Poly(di-n-pentylsilane): The Spectral Consequences of a Helical Conformation in the Solid State
- R.D. Miller
- B.L. Farmer
- et al.
- 2002
- JACS
Alkoxy-Substituted Poly(diarylsilanes): Thermochromism and Solvatochromism
- R.D. Miller
- R. Sooriyakumaran
- 2002
- Macromolecules
Variable-Temperature 13C and 29Si CPMAS NMR Studies of Poly(di-n-hexylsilane)
- Gian C. Gobbi
- William W. Fleming
- et al.
- 2002
- JACS
Structural Study of Thermochromism in Poly(Di-n-alkylgermanes) by Raman Spectroscopy in the Visible and Near-Infrared
- V.M. Hallmark
- C.G. Zimba
- et al.
- 2002
- Macromolecules