F.A. Houle, C.T. Rettner, et al.
Applied Physics Letters
No abstract available.
F.A. Houle, C.T. Rettner, et al.
Applied Physics Letters
Hiroshi Ito, William P. England, et al.
J. Photopolym. Sci. Tech.
M.I. Sanchez, L.K. Sundberg, et al.
SPIE Photomask Technology + EUV Lithography 2013
William W. Fleming
Journal of Applied Polymer Science