Publications

86 results for Nelson Felix

EUV single exposure via patterning at aggressive pitch
- - Jing Guo
  - Jennifer Church
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Nanosheet Metrology Opportunities for Technology Readiness
- - Mary Breton
  - Daniel Schmidt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Exploration of pillar local CDU improvement options for AI applications
- - Charlie Liu
  - Hao Tang
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Overlay error statistics for multiple-exposure patterning
- - Allen Gabor
  - Nelson Felix
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS
Electrical validation of the integration of 193i and DSA for sub-20nm metal cut patterning
- - Chi Chun Liu
  - Richard Farrell
  - et al.
- 2019
- MEMS/NEMS/MOEMS 2019
Fundamentals of resist stochastics effect for single-expose EUV patterning
- - Anuja De Silva
  - Luciana Meli
  - et al.
- 2019
- SPIE Advanced Lithography 2019
LCDU improvement of EUV-patterned vias with DSA
- - Jing Guo
  - Dustin W. Janes
  - et al.
- 2019
- MEMS/NEMS/MOEMS 2019