Publications

23 results for Mary Breton

Development of SiGe Indentation Process Control to Enable Stacked Nanosheet FET Technology
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- ASMC 2020
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS
Structural and Electrical Demonstration of SiGe Cladded Channel for PMOS Stacked Nanosheet Gate-All-Around Devices
- - Shogo Mochizuki
  - B. Colombeau
  - et al.
- 2020
- VLSI Technology 2020
Line top loss and line top roughness characterizations of EUV resists
- - Daniel Schmidt
  - Karen Petrillo
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
AFM characterization for Gate-All-Around (GAA) devices
- - Mary Breton
  - Jennifer Fullam
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- - Dexin Kong
  - Daniel Schmidt
  - et al.
- 2020
- SPIE Advanced Lithography 2020
A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet Devices
- - Nicolas Loubet
  - T. Devarajan
  - et al.
- 2019
- IEDM 2019
Study of TiN and TaN underlayer properties and their influence on W growth
- - Shanti Pancharatnam
  - Gabriel Rodriguez
  - et al.
- 2019
- IEEE Trans Semicond Manuf
Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- - Ravi Bonam
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017