In-Line Metrology for Sub-2nm Technology Nodes
- 2025
- PMI Symposium 2025
Publications
17 results for Daniel Schmidt
Metrology-Design Co-Optimization for BEOL dimensional characterization using scatterometry
- Stefan Schoeche
- Daniel Schmidt
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps
- Padraig Timoney
- Stefan Schoeche
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Deep Learning Assisted Hybrid Metrology of Nanosheet Transistors for Fast Film Characterization
- Tao Cai
- Yifei Li
- et al.
- 2024
- MRS Fall Meeting 2024
In-Line Metrology for Sub-2nm Technology Nodes
- 2024
- FCMN 2024
From Lab to Fab - In-line SIMS for Process Control in Nanosheet Gate-All-Around Device Manufacturing
- Stefan Schoeche
- Katherine Sieg
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Large Feature Wafer Level In-Line Optical Metrology Techniques for Advanced Packaging Schemes
- Katherine Sieg
- Chris Bottoms
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Novel ellipsometry-based machine learning technique for characterization of low sensitivity critical dimensions within gate-all-around transistors
- Houssam Chouaib
- Valeria Dimastrodonato
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Spectral Interferometry for TSV Metrology in Chiplet Technology
- Stefan Schoeche
- Daniel Schmidt
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
In-Line Metrology Requirements and Needs for Leading-Edge Technology
- 2023
- TechConnect 2023