Publications

43 results for Nick Fuller

Integration of a manufacturing grade, k = 2.0 spin-on material in a single damascene structure
- - Willi Volksen
  - Sampath Purushothaman
  - et al.
- 2012
- ECS J. Solid State Sci. Technol.
Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
- - Florian Weilnboeck
  - D. Metzler
  - et al.
- 2011
- Applied Physics Letters
A 0.021 μm² trigate SRAM cell with aggressively scaled gate and contact pitch
- - Michael A. Guillorn
  - Josephine Chang
  - et al.
- 2011
- VLSI Technology 2011
Plasma etch challenges for porous low k materials for 32nm and beyond
- - Catherine Labelle
  - R. Srivastava
  - et al.
- 2011
- CSTIC 2011
Development and characterization of advanced process technologies for the fabrication of crystalline-Si solar cells
- - Satyavolu S. Papa Rao
  - Kate Fisher
  - et al.
- 2010
- PVSC 2010
Patternable low-κ material for "greener" semiconductor manufacturing
- - Qinghuang Lin
  - Shyng-Tsong Chen
  - et al.
- 2010
- ICSICT 2010
Gate-all-around silicon nanowire MOSFETs and circuits
- - Jeffrey W. Sleight
  - Sarunya Bangsaruntip
  - et al.
- 2010
- DRC 2010
Reflectance and substrate currents of dielectric layers under vacuum ultraviolet irradiation
- - H. Sinha
  - D.B. Straight
  - et al.
- 2010
- JVSTA
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- - Qinghuang Lin
  - Shyng-Tsong Chen
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
High performance and highly uniform metal hi-k gate-all-around silicon nanowire mosfets
- - Jeffrey W. Sleight
  - Sarunya Bangsaruntip
  - et al.
- 2010
- ECS Transactions