Building a cognitive platform for the managed IT services lifecycle
- K. Kloeckner
- Constantin Adam
- et al.
- 2018
- IBM J. Res. Dev
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42 results for Nick Fuller
Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
- Hiroyuki Miyazoe
- Sebastian U. Engelmann
- et al.
- 2017
- JVSTA
Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer
- Sebastian U. Engelmann
- Robert L. Bruce
- et al.
- 2017
- JVSTB
Mronline: MapReduce online performance tuning
- Min Li
- Liangzhao Zeng
- et al.
- 2014
- HPDC 2014
Highly selective silicon nitride etching to Si and SiO2 for a gate sidewall spacer using a CF3I/O2/H2 neutral beam
- Daiki Nakayama
- Akira Wada
- et al.
- 2013
- Journal of Physics D: Applied Physics
The effects of vacuum ultraviolet radiation on low-k dielectric films
- H. Sinha
- H. Ren
- et al.
- 2012
- Journal of Applied Physics
The effects of plasma exposure on low-k dielectric materials
- J.L. Shohet
- H. Ren
- et al.
- 2012
- SPIE Advanced Lithography 2012
Patterning of CMOS device structures for 40-80nm pitches and beyond
- Sebastian U. Engelmann
- R.M. Martin
- et al.
- 2012
- SPIE Advanced Lithography 2012
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Integration of a manufacturing grade, k = 2.0 spin-on material in a single damascene structure
- Willi Volksen
- Sampath Purushothaman
- et al.
- 2012
- ECS J. Solid State Sci. Technol.