David B. Mitzi
Journal of Materials Chemistry
The electrical and physical properties of ultra-thin zirconium silicate films deposited by the jet-vapor-deposition (JVD) process were reported. The fabrication of the films with equivalent oxide thickness of 1 nm with high thermal stability, low leakage and good electrical properties was shown. It was shown that zirconium silicate films can survive an annealing temperature as high as 1000°C.
David B. Mitzi
Journal of Materials Chemistry
R. Ghez, M.B. Small
JES
J.C. Marinace
JES
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids