Texture formation in Ti-Ta alloy disilicide thin films

Abstract

Texture formation in Ti-Ta alloy thin films on Si(001) and polysilicon substrates, was investigated using in situ and ex situ x-ray diffraction. Diffraction patterns were collected every 0.5 s during phase transformation kinetic studies. Results indicated that the addition of Ta enhanced the C49-C54 phase transition and changed the preferred orientation of C54 TiSi2 film. In situ and ex situ results showed that at 6 at.% Ta concentration, films on Si(001) and polysilicon developed a strongly oriented C54(010) texture along the sample normal.