G.S. Oehrlein
ECS Meeting 1983
We describe a plasma-based dry etching procedure which permits selective etching of Si over Ge with a Si/Ge etch rate ratio of over 70 and negligible etching of the Ge underlayer. This is achieved in a SF6/H 2/CF4 gas mixture by the formation of a thin (≅3 nm) involatile etch stop layer on the Ge surface which consists of Ge-sulfide and carbonaceous material.
G.S. Oehrlein
ECS Meeting 1983
M. Haverlag, D. Vender, et al.
Applied Physics Letters
J.L. Lindström, H. Weman, et al.
physica status solidi (a)
D. Angell, G.S. Oehrlein
SPIE Processing Integration 1990