Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A set of key processes for nanometer-scale pattern transfer using a self-assembled polymer mask was developed and integrated. As a result, a variety of silicon nanostructures were built.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
J.Z. Sun
Journal of Applied Physics
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters