Self-assembling materials for lithographic patterning: Overview, status and moving forward

Abstract

We survey several different approaches wherein self-assembly has been applied in lithographic patterning. As part of this survey, we trace the evolution of block copolymer directed self-assembly used as lithographic technique, and summarize its current status. We compare a process based on block copolymer lithography with an equivalent process based on spacer pitch division. We conclude with a brief discussion of design issues and future research in the field. © 2010 Copyright SPIE - The International Society for Optical Engineering.