G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
A new family of highly sensitive negative resists for Deep UV, X-ray and electron beam exposure capable of better than 100 nm resolution and very high pattern aspect ration has been investigated. The resists are based epoxidized novolac resins sensitized with acid generating compounds. © 1990.
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
M. Hargrove, S.W. Crowder, et al.
IEDM 1998
K.N. Tu
Materials Science and Engineering: A