Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A new family of highly sensitive negative resists for Deep UV, X-ray and electron beam exposure capable of better than 100 nm resolution and very high pattern aspect ration has been investigated. The resists are based epoxidized novolac resins sensitized with acid generating compounds. © 1990.
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials