Publication
Materials Science and Engineering: A
Paper

Metastable phase formation in thin film reactions

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Abstract

The phenomenon of metastable phase formation during a constant temperature and constant pressure thin film reaction is explained by a kinetic model emphasizing the rate of transition. It is assumed that the reaction obeys a maximum time-dependent rather than time-independent negative free energy change. The product persists in the metastable state due to a high activation barrier to later transition. © 1991.

Date

25 Mar 1991

Publication

Materials Science and Engineering: A

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