Barry P. Linder, Eduard Cartier, et al.
VLSI-DAT 2013
We report a time-dependent clustering model for non-uniform dielectric breakdown. Its area scaling and low-percentile scaling properties are rigorously investigated. While at high percentiles non-uniform area scaling dominates, the model restores the weakest-link characteristics at low percentiles relevant for reliability projection. As a result, we develop a comprehensive methodology for the parameter extraction and projection methodology for non-uniform dielectric breakdown. Excellent agreement is obtained between the model and the experimental data of back-end-of-line low-k dielectrics and front-end-of-line gate dielectrics, suggesting a wide range of applications of this model in the field of dielectric breakdown reliability. © 2013 AIP Publishing LLC.
Barry P. Linder, Eduard Cartier, et al.
VLSI-DAT 2013
Miaomiao Wang, Pranita Kulkarni, et al.
IRPS 2010
Miaomiao Wang, Jingyun Zhang, et al.
IRPS 2019
James H. Stathis
IRPS 2018