Laser-induced deposition of alumina from condensed layers of organoaluminum compounds and water

The photoassisted deposition of thin aluminum oxide films from layers of trimethylaluminum (TMA), dimethylaluminum hydride, and aluminum hexafluoroacetylacetonate condensed with water on a cold substrate has been investigated. Laser energies of 4.6 or 2.3 eV were used to drive the reactions which led to film growth. Experiments show that clean aluminum oxide films can be synthesized at 80 K by irradiating co-condensed TMA and H2O with 4.6 eV light. Techniques used to characterize the films include Auger electron spectroscopy and scanning electron microscopy.