A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
To extend the scaling beyond the most widely used poly(styrene-b-methyl methacrylate) (PS-b-PMMA), organic high-χ block copolymers (BCPs) were developed. Vertically oriented BCP domains were obtained by simple coat and bake process without application of an additional layer of a topcoat material. In addition, process-friendly conditions including low bake temperature (< 200 °C) and short bake time (< 5 min) provided a simple scheme to integrate these high-χ block copolymers to standard lithography process and pre-patterns defined by 193i lithography. Successful demonstration of directed self-assembly of these high-χ block copolymers on 193i-defined guiding pre-patterns offers a simple route to access well-aligned perpendicular lamellae and cylinders with a pitch less than 20 nm.
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids
T. Schneider, E. Stoll
Physical Review B
T.N. Morgan
Semiconductor Science and Technology