Measuring Local CD Uniformity in EUV vias with scatterometry and machine learning
- Dexin Kong
- Daniel Schmidt
- et al.
- 2020
- SPIE Advanced Lithography 2020
Publications
Patents
- US
- 11947712
- US
- 11688636
- US
- 11561481
- US
- 11194254
- US
- 11182722
- US
- 11067896
- US
- 10545409
Top collaborators
LM
Luciana Meli
Senior Manager: Patterning & Metrology
IA
Ishtiaq Ahsan
Senior Manager, Yield/ Test & Characterization, IBM Semiconductor Technology Research & Development
NF
Nelson Felix
Director, Techinical Business Development - IBM Semiconductors
MB
Mary Breton
Manager: Testsite Macro Design, GRV, & Infrastructure