Controlling and plasma- and process- induced damage
- T.B. Hook
- 2001
- Semiconductor International
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8 results at Semiconductor International
Designing porous low-k dielectrics
- Josh H. Golden
- Craig J. Hawker
- et al.
- 2001
- Semiconductor International
Dedicated pre-clean reduces Epi's thermal budget
- Arkadii V. Samoilov
- Dale Du Bois
- et al.
- 2000
- Semiconductor International
Plasma abatement reduces PFC emission
- Victor Vartanian
- Laurie Beu
- et al.
- 2000
- Semiconductor International
Progress in 193 nm photoresists
- R.D. Allen
- 1997
- Semiconductor International
Ionized magnetron sputtering for lining and filling trenches and vias
- S.M. Rossnagel
- 1996
- Semiconductor International
Ionized magnetron sputtering for lining and filling trenches and vias
- S.M. Rossnagel
- 1996
- Semiconductor International
THIN FILM TECHNOLOGY FOR ADVANCED SEMICONDUCTORS. PART 3: VLSI INTERCONNECT METALIZATION.
- P.S. Ho
- 1985
- Semiconductor International