Michiel Sprik
Journal of Physics Condensed Matter
The use of a dedicated chamber to perform pre-epi deposition cleaning allows native oxide removal with a low thermal budget, and significantly improves throughput of low-temperature Si and SiGe applications. Wafers processed in the cleaning chamber show no detectable contaminants, and the cleansed surface is actually significantly smoother because of cleaning down to a sub-angstrom level.
Michiel Sprik
Journal of Physics Condensed Matter
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Frank Stem
C R C Critical Reviews in Solid State Sciences