J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
The use of a dedicated chamber to perform pre-epi deposition cleaning allows native oxide removal with a low thermal budget, and significantly improves throughput of low-temperature Si and SiGe applications. Wafers processed in the cleaning chamber show no detectable contaminants, and the cleansed surface is actually significantly smoother because of cleaning down to a sub-angstrom level.
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
Peter J. Price
Surface Science