Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paper
Progress in 193 nm photoresists
Abstract
State-of-the-art resist for 193 nm lithography are analyzed with respect to possible resolution, photospeed and etch resistance. This paper describes this photoresist design study and emphasizes the many opportunities and challenges that the photoresist and semiconductor industry face with the unfolding of this technology.