Topology and context-based pattern extraction using line-segment Voronoi diagram
- Sandeep Kumar Dey
- Panagiotis Cheilaris
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Publications
24 results at SPIE Advanced Lithography 2015
Accurate and fast computation of transmission cross coefficients
- Ştefan Apostol
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperInverse lithography using sparse mask representations
- Radu C. Ionescu
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperExperiments using automated sample plan selection for OPC modeling
- Ramya Viswanathan
- Om Jaiswal
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperForbidden pitches: Causes, source optimization, and their role in design rules
- Ştefan Apostol
- Paul Hurley
- 2015
- SPIE Advanced Lithography 2015
Conference paperInduced e-beam charge impact on spatial orientation of gate-All-Around silicon wires device fabricated on boron nitride substrate
- Shimon Levi
- Konstantin Chirko
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperMachine learning and predictive data analytics enabling metrology and process control in IC fabrication
- Narender Rana
- Yunlin Zhang
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperEtch patterning for advanced devices
- Effendi Leobandung
- 2015
- SPIE Advanced Lithography 2015
Conference paperMethodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperTowards production ready processing with a state-of-the-art EUV cluster
- Karen Petrillo
- Nicole Saulnier
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper