Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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21 results at SPIE Advanced Lithography 2009

Modeling and experiments of non-telecentric thick mask effects for EUV lithography
- - Gregory McIntyre
  - Chiew-Seng Koay
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Characterization of vinyl ether UV-cure nanoimprint resist
- - Taiichi Furukawa
  - Frances A. Houle
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Exposure tool settings and OPC strategies for EUV Lithography at the 16nm node
- - Yunfei Deng
  - Jongwook Kye
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Flare evaluation of ASML alpha demo tool
- - Hiroyuki Mizuno
  - Gregory McIntyre
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Compensating non-optical effects using electrically-driven optical proximity correction
- - Shayak Banerjee
  - Kanak B. Agarwal
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Modeling and simulation of transistor performance shift under pattern-dependent RTA process
- - Yun Ye
  - Frank Liu
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Parameter-specific electronic measurement and analysis of sources of variation using ring oscillators
- - Lynn T.-N. Wang
  - Liang-Teck Panga
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Cr migration on 193nm binary photomasks
- - John Bruley
  - Geoffrey Burr
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture
- - Gregory McIntyre
  - Richard Tu
- 2009
- SPIE Advanced Lithography 2009
The measurement uncertainty challenge of advanced patterning development 727203
- - Narender Rana
  - Chas Archie
  - et al.
- 2009
- SPIE Advanced Lithography 2009