Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
- M. Surendra
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Deposition of aluminum oxide films with high refractive index
- K.K. Shih
- D.B. Dove
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high-density plasmas. II. Silicon dioxide and silicon etching using CF4 and CHF
- Y. Zhana
- D. Vender
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Adhesion durability of tantalum BPDA-PDA polyimide interfaces
- D. Neuaroschl
- B.K. Furman
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Tribochemistry at Lubricated Interfaces
- Xiaohe Pan
- C.S. Bhatia
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Model of Lead Loss in Pb(MgxNb1-x)Ozion Beam Sputtered Thin Films
- J.P. Doyle
- J.J. Cuomo
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Morphology and bonding measured from boron-nitride powders and films using near-edge x-ray absorption fine structure
- T. Sato
- A. Chaiken
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- O. Joubert
- G.S. Oehrlein
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Si(100)2-1+Sb surfaces studied with photoemission and optical spectroscopy
- H. Bernhoff
- D. Purdie
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Quantum size effects in ultrathin Cu(100) films
- G.J. Mankey
- R.F. Willis
- et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films