Publications

24 results at SPIE Advanced Lithography 2015

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
- - Hsinyu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
- - Scott D. Halle
  - Luciana Meli
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Implementation of assist features in EUV lithography
- - Fan Jiang
  - Martin Burkhardt
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Fin formation using graphoepitaxy DSA for FinFET device fabrication
- - Chi Chun Liu
  - Fee Li Lie
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Low-energy electron (0-100eV) interaction with resists using LEEM
- - A. Thete
  - Daniël Geelen
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Best focus shift mechanism for thick masks
- - Martin Burkhardt
  - Ananthan Raghunathan
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Tailored molecular glass resists for scanning probe lithography
- - Christian Neuber
  - Hans-Werner Schmidt
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers
- - Eri Hirahara
  - Margareta Paunescu
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Plasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL
- - Changwoo Lee
  - Bhaskar Nagabhirava
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
EUV processing and characterization for BEOL
- - Nicole Saulnier
  - Yongan Xu
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper