Radiochemical determination of damage profiles in silicon
- B.J. Masters
- J.M. Fairfield
- et al.
- 2006
- Radiation Effects
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3 results for B.J. Masters
Boron atom distributions in ion-implanted silicon by the (n,4He) nuclear reaction
- J.F. Ziegler
- B.L. Crowder
- et al.
- 2003
- Applied Physics Letters
Channeling in low energy boron ion implantation
- Alwin E. Michel
- R.H. Kastl
- et al.
- 1984
- Applied Physics Letters