The Etching of Crystallographically Determined Orifices in Sapphire
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
Publications
39 results for Arnold Reisman
On the Removal of Insulator Process Induced Radiation Damage from Insulated Gate Field Effect Transistors at Elevated Pressure
- A. Reisman
- J.M. Aitken
- et al.
- 2019
- JES
Plasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their Elimination
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
The Controlled Etching of Silicon in Catalyzed Ethylenediamine-Pyrocatechol-Water Solutions
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
X-Ray Damage Considerations in MOSFET Devices
- J.R. Maldonado
- S.S. Iyer
- 2019
- JES
Low Energy X-Ray and Electron Damage to IGFET Gate Insulators
- C.J. Merz
- J.R. Maldonado
- et al.
- 2019
- JES
The Effects of Pressure, Temperature, and Time on the Annealing of lonizing Radiation Induced Insulator Damage in N-channel IGFET's
- A. Reisman
- C.J. Merz
- 2019
- JES