Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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Year

17 results for Raghuveer Patlolla

An OCD perspective of line edge and line width roughness metrology
- - Ravi Bonam
  - R. Muthinti
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Comprehensive analysis of line-edge and line-width roughness for EUV lithography
- - Ravi Bonam
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Experimental study of nanoscale Co damascene BEOL interconnect structures
- - James Kelly
  - James H.-C. Chen
  - et al.
- 2016
- IITC/AMC 2016
BEOL process integration for the 7 nm technology node
- - T. Standaert
  - Genevieve Beique
  - et al.
- 2016
- IITC/AMC 2016
Tungsten and cobalt metallization: A material study for MOL local interconnects
- - Vimal Kamineni
  - Mark Raymond
  - et al.
- 2016
- IITC/AMC 2016
Performance of ultrathin alternative diffusion barrier metals for next - Generation BEOL technologies, and their effects on reliability
- - Takeshi Nogami
  - M. Chae
  - et al.
- 2014
- IITC/AMC 2014
CMP development for Ru liner structures beyond 14nm
- - Raghuveer Patlolla
  - Koichi Motoyama
  - et al.
- 2018
- ECS J. Solid State Sci. Technol.