A 14 nm embedded STT-MRAM CMOS technology
- Daniel C. Edelstein
- M. Rizzolo
- et al.
- 2020
- IEDM 2020
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6 results for A. Dutta
First Experimental Demonstration of MRAM Data Scrubbing: 80 Mb MRAM with 40 nm junctions for Last Level Cache Applications
- H. Wu
- V. Katragadda
- et al.
- 2021
- IEDM 2021
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- A. Dutta
- Jennifer Church
- et al.
- 2020
- SPIE Advanced Lithography 2020
Inorganic hardmask development for EUV patterning
- Anuja De Silva
- A. Dutta
- et al.
- 2018
- SPIE Advanced Lithography 2018
Patterning material challenges for improving euv stochastics
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- J. Photopolym. Sci. Tech.
Inorganic hardmask development for extreme ultraviolet patterning
- Anuja De Silva
- A. Dutta
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS