Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
Publications
13 results for Scott Mansfield
Applicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
32 NM Logic patterning options with immersion lithography
- K. Lai
- S. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
The comparison of OPC performance and run time for dense versus sparse solutions
- Amr Abdo
- Ian Stobert
- et al.
- 2008
- SPIE Advanced Lithography 2008
The effect of OPC optical and resist model parameters on the model accuracy, run time, and stability
- Amr Abdo
- Rami Fathy
- et al.
- 2006
- SPIE Photomask Technology 2006
The problem of optimal placement of Sub-Resolution Assist Features (SRAF)
- Maharaj Mukherjee
- Scott Mansfield
- et al.
- 2005
- SPIE Advanced Lithography 2005
Linewidth variation characterization by spatial decomposition
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
The mask error factor in optical lithography
- Alfred K. Wong
- Richard A. Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
Characterization of line width variation
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2000
- SPIE Advanced Lithography 2000
Level-specific lithography optimization for 1-Gb DRAM
- Alfred K. Wong
- Richard Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf