The Semiconductor Supply Chain in an Era of Low GWP and/or PFAS-Free Gas Chemistries
- 2025
- SPIE Advanced Lithography + Patterning 2025
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81 results for Eric Joseph
The Viability of HFO-1234ze(E) (trans-1,3,3,3-Tetrafluoropropene) as a Low Global Warming Potential Silicon Dioxide Etch Gas
- Aaron Windsor
- Jeremy Clark
- et al.
- 2025
- JVSTB
Plasma Processing and the Semiconductor Supply Chain in an Era of Low GWP and/or PFAS-Free Gas Chemistries
- 2024
- CMC Conference 2024
Centering Sustainability in Process Development Through Improved Characterization of HFC-PFC Byproducts
- 2024
- IEEE Trans Semicond Manuf
My path to AVS Fellow: Non-volatile Memory processing from fundamental understanding to the promise of atomic layer etching and sustainable etch precursors
- 2023
- AVS 2023
Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
- S. G. Walton
- D. R. Boris
- et al.
- 2021
- JVSTA
Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
- Adam Pranda
- Kang Yi Lin
- et al.
- 2020
- JVSTA
Preface for the Festschrift Honoring Dr. Steve Rossnagel
- Ivan Petrov
- J. E. Greene
- et al.
- 2020
- JVSTA
Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
- Kang Yi Lin
- Chen Li
- et al.
- 2020
- JVSTA
Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- Kang Yi Lin
- Chen Li
- et al.
- 2018
- JVSTA