Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for Romain Lallement

Exploring the stochastics cliff: Understanding the impact of LER/LWR to stochastic defectivity and yield
- - Jennifer Church
  - Graham Jensen
  - et al.
- 2021
- SPIE Photomask Technology + EUV Lithography 2021
Effect of high NA "half-field" printing on overlay error
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
EUVL mask process development and verification using advanced modeling and characterization techniques
- - Michael Green
  - Romain Lallement
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
- - Jennifer Church
  - Luciana Meli
  - et al.
- 2020
- J. Micro/Nanolithogr. MEMS MOEMS