Publications

109 results for Sebastian Engelmann

Patterning of CMOS device structures for 40-80nm pitches and beyond
- - Sebastian U. Engelmann
  - R.M. Martin
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
- - Hsin-Yu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Improved frequency response in a SiGe npn device through improved dopant activation
- - Jim Adkisson
  - Marwan H. Khater
  - et al.
- 2012
- ECS Meeting 2012
Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
- - Florian Weilnboeck
  - D. Metzler
  - et al.
- 2011
- Applied Physics Letters
A 0.021 μm² trigate SRAM cell with aggressively scaled gate and contact pitch
- - Michael A. Guillorn
  - Josephine Chang
  - et al.
- 2011
- VLSI Technology 2011
Scaling of SOI FinFETs down to fin width of 4 nm for the 10nm technology node
- - Josephine Chang
  - Michael A. Guillorn
  - et al.
- 2011
- VLSI Technology 2011
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Metallization opportunities and challenges for future back-end-of-the-line technology
- - Cyril Cabral Jr.
  - Benjamin Fletcher
  - et al.
- 2010
- ADMETA 2010
Gate-all-around silicon nanowire 25-stage CMOS ring oscillators with diameter down to 3 nm
- - Sarunya Bangsaruntip
  - A. Majumdar
  - et al.
- 2010
- VLSI Technology 2010
Gate-all-around silicon nanowire MOSFETs and circuits
- - Jeffrey W. Sleight
  - Sarunya Bangsaruntip
  - et al.
- 2010
- DRC 2010