Comprehensive analysis of line-edge and line-width roughness for EUV lithographyRavi BonamChi Chun Liuet al.2017SPIE Advanced Lithography 2017Conference paper
EUV patterning successes and frontiersNelson FelixDaniel Corlisset al.2016SPIE Advanced Lithography 2016Conference paper
Advanced in-line metrology strategy for self-aligned quadruple patterningRobin ChaoMary Bretonet al.2016SPIE Advanced Lithography 2016Conference paper