Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
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99 results for Robert Allen
Development of an incremental structural parameter model for predicting reactive ion etch rates of 193 nm photoresist polymers
- Thomas I. Wallow
- P.J. Brock
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Progress in 193 nm photoresists
- R.D. Allen
- 1997
- Semiconductor International
Photoresists for 193-nm lithography
- R.D. Allen
- G.M. Wallraff
- et al.
- 1997
- IBM J. Res. Dev
Synthesis of polyester graft copolymers via the macromonomer technique: Application of near-IR spectroscopy as a process monitor
- T.E. Long
- R.D. Allen
- et al.
- 1996
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
A method for rubber toughening powder coatings
- J.L. Hedrick
- R.D. Allen
- et al.
- 1993
- Polymer Bulletin
Synthesis and properties of xylenyl ether-dimethylsiloxane triblock polymers
- Robert D. Allen
- James L. Hedrick
- 1988
- Polymer Bulletin
Preparation of high purity, anionic polymerization grade alkyl methacrylate monomers
- R.D. Allen
- T.E. Long
- et al.
- 1986
- Polymer Bulletin