Publications

This is our catalog of recent publications authored by IBM researchers, in collaboration with the global research community. We’re currently adding our back catalog of more than 110,000 publications. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

Featured collections

Year

6 results for Lei Sun

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
- - Ruilong Xie
  - Pietro Montanini
  - et al.
- 2016
- IEDM 2016
Introduction of pre-etch deposition techniques in EUV patterning
- - Xun Xiang
  - Genevieve Beique
  - et al.
- 2018
- SPIE Advanced Lithography 2018
Single-expose patterning development for EUV lithography
- - Anuja De Silva
  - Karen Petrillo
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Plasma etch patterning of EUV lithography: Balancing roughness and selectivity trade off
- - Sebastian U. Engelmann
  - Qinghuang Lin
  - et al.
- 2016
- SPIE Advanced Lithography 2016
EUV patterning successes and frontiers
- - Nelson Felix
  - Daniel Corliss
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Clear sub-resolution assist features for EUV
- - Martin Burkhardt
  - Greg McIntyre
  - et al.
- 2014
- SPIE Advanced Lithography 2014

Featured collections

Popular topics

Year

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Introduction of pre-etch deposition techniques in EUV patterning

Single-expose patterning development for EUV lithography

Plasma etch patterning of EUV lithography: Balancing roughness and selectivity trade off

EUV patterning successes and frontiers

Clear sub-resolution assist features for EUV