Surface initiated polymer thin films for the area selective deposition and etching of metal oxidesThomas G. PattisonAlexander E. Hesset al.2020ACS Nano
Exploring the Limits of Cobalt Liner Thickness in Advanced Copper InterconnectsNicholas A. LanzilloKisik Choiet al.2019IEEE Electron Device Letters
DTCO Guided Process Integration: Case Studies From FEOL & BEOL with BSPDNMinhaz AbedinShahrukh Khanet al.2024ASMC 2024
DTCO Guided Process Integration: Case Studies from FEOL & BEOL with BSPDN Topic: DTCO/DFMMinhaz AbedinShahrukh Khanet al.2024ASMC 2024
A novel integration scheme for self-aligend Ru topvia as post-Cu alternative metal interconnectsK. MotoyamaD. Metzleret al.2023IITC/MAM 2023
Capacitive Impacts of Etch-Induced Dielectric Damage in Highly-Scaled Interconnect ArchitecturesJanet M. WilsonNicholas A. Lanzillo2022IITC 2022
Metal-induced line width variability challenge and mitigation strategy in advanced post-Cu interconnectsKoichi MotoyamaNicholas A. Lanzilloet al.2022IITC 2022
Dual Damascene BEOL Extendibility With Cu Reflow / Selective TaN And Co/Cu CompositeP. BhosaleN. Lanzilloet al.2021VLSI Technology 2021
Comprehensive BEOL Performance Assessment: Interconnects Optimized for Signal Routing and Power Delivery in Advanced CMOS Technology Nodes (Invited)Nicholas A. LanzilloRwik Senguptaet al.2020IITC 2020
Composite Interconnects for High-Performance Computing beyond the 7nm NodeP. BhosaleS. Parikhet al.2020VLSI Technology 2020