Publications

10 results for H. Okorn-Schmidt

A selective etching process for chemically inert high-k metal oxides
- - Katherine L. Saenger
  - Harald F. Okorn-Schmidt
  - et al.
- 2002
- MRS Proceedings 2002
High mobility p-channel germanium MOSFETS with a thin Ge oxynitride gate dielectric
- - Huiling Shang
  - Harald Okorn-Schmidt
  - et al.
- 2002
- IEDM 2002
High temperature stability of Al₂O₃ dielectrics on Si: Interfacial metal diffusion and mobility degradation
- - S. Guha
  - E. Gusev
  - et al.
- 2002
- Applied Physics Letters
Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films
- - A.C. Callegari
  - E. Cartier
  - et al.
- 2001
- Journal of Applied Physics
Ultrathin high-K metal oxides on silicon: Processing, characterization and integration issues
- - E. Gusev
  - E. Cartier
  - et al.
- 2001
- Microelectronic Engineering
Enhancement of Semiconductor Wafer Cleaning by Chelating Agent Addition
- - Glenn W. Gale
  - David L. Rath
  - et al.
- 2001
- JES
Ultrathin high-K gate stacks for advanced CMOS devices
- - E. Gusev
  - D.A. Buchanan
  - et al.
- 2001
- Technical Digest - International Electron Devices Meeting
Characterization of DI water/O₃ oxidation of Si (100) and Si (111) surfaces by OCP measurements
- - H. Okorn-Schmidt
  - C. D'Emic
  - et al.
- 2000
- Diffusion and Defect Data Pt.B: Solid State Phenomena
80 nm poly-silicon gated n-FETs with ultra-thin Al₂O₃ gate dielectric for ULSI applications
- - D.A. Buchanan
  - E. Gusev
  - et al.
- 2000
- IEDM 2000
Characterization of silicon surface preparation processes for advanced gate dielectrics
- - H. Okorn-Schmidt
- 1999
- IBM J. Res. Dev