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Charge trapping in aggressively scaled metal gate/high-κ stacksE. GusevV. Narayananet al.2004IEDM 2004
Advanced gate stacks with fully silicided (FUSI) gates and high-κ dielectrics: Enhanced performance at reduced gate leakageE. GusevC. Cabral Jr.et al.2004IEDM 2004
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A Simplified Hybrid Orientation Technology (SHOT) for high performance CMOSB. DorisY. Zhanget al.2004VLSI Technology 2004
High performance thick copper inductors in an RF technologyKunal VaedWilliam Grahamet al.2004SPIE Micromachining and Microfabrication 2004
Fabrication and Mobility Characteristics of Ultra-thin Strained Si Directly on Insulator (SSDOI) MOSFETsK. RimK.K. Chanet al.2003IEDM 2003