Publications

9 results for K. Chiong

Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- - Philip J. Coane
  - Kaolin G. Chiong
  - et al.
- 1993
- Microlithography 1993
A Scaled 0.25- μm Bipolar Technology Using Full e-Beam Lithography
- - John D. Cressler
  - James Warnock
  - et al.
- 1992
- IEEE Electron Device Letters
A full E-beam 0.25 mu m bipolar technology with sub-25 ps ECL gate delay
- - J. Warnock
  - J.D. Cressler
  - et al.
- 1991
- IEDM 1991
Resist patterning for sub-quarter-micrometer device fabrications (Invited Paper)
- - K. Chiong
  - F.J. Hohn
- 1990
- Microlithography 1990
Sensitive electron beam resist systems based on acid-catalyzed deprotection
- - Hiroshi Ito
  - Lester A. Pederson
  - et al.
- 1989
- Proceedings of SPIE 1989
Aqueous developable, negative working resist made of chlorinated novolac resin
- - H. Hiraoka
  - A.M. Patlach
  - et al.
- 1989
- Proceedings of SPIE 1989
Contrast and sensitivity trade-offs of resist processing in electron beam lithography at 0.5µm and below
- - W. Molzen
  - Michael G. Rosenfield
  - et al.
- 1989
- Proceedings of SPIE 1989
Sub-halfmicron negative resist systems by image reversal
- - K. Chiong
  - H. Hiraoka
- 1989
- Proceedings of SPIE 1989
0. 5 MICRON GATE CMOS TECHNOLOGY USING E-BEAM/OPTICAL MIX LITHOGRAPHY.
- - L.K. Wang
  - Y. Taur
  - et al.
- 1985
- VLSI Technology 1985