Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for P. Rudeck

Fully scaled 0.5 micron CMOS technology using variable shaped electron beam lithography
- - Philip Coane
  - Paul Rudeck
  - et al.
- 1989
- Proceedings of SPIE 1989
The angular dependence of preferential sputtering and composition in aluminum-copper thin films
- - P. Rudeck
  - J.M.E. Harper
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- - P. Coane
  - P. Rudeck
  - et al.
- 1989
- Microelectronic Engineering
Angular dependence of preferential sputtering and composition in aluminum-copper thin films
- - P. Rudeck
  - J.M.E. Harper
  - et al.
- 1988
- Applied Physics Letters
Electron beam / optical mixed lithography at half-micron ground rules
- - P. Coane
  - P. Rudeck
  - et al.
- 1986
- Microelectronic Engineering