Publications

24 results for David Seeger

Optimization of ESCAP photoresist for x-ray lithography
- - A.T.S. Pomerene
  - K.E. Petrillo
  - et al.
- 1994
- Microlithography 1994
Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
- - R. Viswanathan
  - David Seeger
  - et al.
- 1994
- Microelectronic Engineering
Photoresist process latitude optimization for synchrotron x-ray lithography
- - Andrew T. Pomerene
  - David E. Seeger
  - et al.
- 1993
- Microlithography 1993
Positive mode silylation process characterization
- - D.C. La Tulipe
  - A.T.S. Pomerene
  - et al.
- 1992
- Microelectronic Engineering
A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes
- - Michael G. Rosenfield
  - S. Rishton
  - et al.
- 1991
- Microelectronic Engineering
Importance of adsorption in ion beam induced deposition of carbon
- - S.J. Kirch
  - David Seeger
- 1990
- Applied Physics Letters
A 0.5 μm fully scaled two-level metal fully planarized interconnect structure fabricated with X-ray lithography
- - D. Moy
  - L.K. Wang
  - et al.
- 1990
- VLSI Technology 1990
0.5 μm CMOS devices and circuits fabricated using synchrotron X-ray lithography
- - L.K. Wang
  - C.H. Hsu
  - et al.
- 1989
- VLSI Technology 1989
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- - R. Viswanathan
  - R.E. Acosta
  - et al.
- 1989
- Microelectronic Engineering
X-ray transmission through low atomic number particles
- - R.A. DellaGuardia
  - David Seeger
  - et al.
- 1989
- Microelectronic Engineering