Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
15 results for Alan Wilson
Distortion of masks for x-ray lithography
- R.E. Acosta
- J.R. Maldonado
- et al.
- 1985
- Microelectronic Engineering
Characterization of stress in the absorber of x-ray masks using a holographic technique
- R.E. Acosta
- A.D. Wilson
- et al.
- 1985
- Microelectronic Engineering
Electron-Beam Systems for Precision Micron and Submicron Lithography
- Alan D. Wilson
- 1983
- Proceedings of the IEEE
1 μm MOSFET VLSI Technology: Part VI—Electron-Beam Lithography
- Warren D. Grobman
- Hans E. Luhn
- et al.
- 1979
- IEEE T-ED