Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
Paper
Distortion of masks for x-ray lithography
Abstract
Experimental and theoretical results are presented on the determination of distortion induced during the process of fabrication of X-ray lithography masks. The studies were performed on B-doped Si and on B-N-H mask substrates. © 1985.
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