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Journal of Magnetism and Magnetic Materials
Experimental and theoretical results are presented on the determination of distortion induced during the process of fabrication of X-ray lithography masks. The studies were performed on B-doped Si and on B-N-H mask substrates. © 1985.
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
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MRS Fall Meeting 2020