Electron-Beam Systems for Precision Micron and Submicron Lithography

Abstract

This paper discusses the engineering of electron-beam sys tems for the generation of micron and submicron lithography. Design objectives and options for the electron-beam column, X-Y workpiece stage, laser interferometer, pattern generator, software, and general engineering are the major topics. Copyright © 1983 by The Institute of Electrical and Electronics Engineers, Inc.v