Track based techniques to improve high-resolution EUV patterning defectivity

Abstract

Extreme ultraviolet lithography (EUVL) technology is one of the leading candidates under consideration for enabling the next generation of devices, for 7nm node and beyond. As the focus shifts to driving down the 'effective' k1 factor and enabling the second generation of EUV patterning, new techniques and methods must be developed to reduce the overall defectivity, mitigate pattern collapse, and eliminate film-related defects. In addition, CD uniformity improvements must be continued to meet patterning performance requirements. Tokyo Electron Limited (TELTM) and IBM Corporation are continuously developing manufacturing quality processes for EUV.