PaperOn the spectral radius of (0,1)-matricesR.A. Brualdi, A.J. HoffmanLinear Algebra and Its Applications
Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Conference paperOn a partial ordering relation derived from redundancy of Slepian-Wolf codingDa-Ke He, Ashish Jagmohan, et al.ISIT 2007
