Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We have found that the product of the critical current and the resistance of a grain-boundary junction scale with the resistance of the boundary. This scaling is observed to hold for a variety of samples prepared by evaporation or laser ablation and whose critical current density varies by three orders of magnitude. © 1990 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ming L. Yu
Physical Review B
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IEEE T-MTT
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics